SM Series
Cleaning of ceramic membrane equipment.
Time：2018.01.30
The following is the specific cleaning process of ceramic membrane device:
Pure water cleaning
Flush the equipment to the system with pure water.
Alkaline cleaning
Using pure water as 1% to 3%, the temperature of 60-70 ℃ of NaOH aqueous solution, cleaning about 50 minutes. Rinse with pure water to neutral.
Acid cleaning
Using pure water as 1%, citric acid aqueous solution for 30 to 40 ℃, temperature cleaning about 50 minutes. Rinse with pure water to neutral.
Note:
For the first time, the film should be recycled. The method is:
Alkaline cleaning:
With temperature is about 60-70 ℃, the concentration of 1% NaOH solution cleaning, time for about 30 minutes with deionized water rinse to neutral;
Pickling:
With temperature is about 30 to 40 ℃, the concentration of 1% lemon acid solution to clean, time for about 30 minutes with deionized water rinse to neutral.
Pure water cleaning
Flush the equipment to the system with pure water.
Alkaline cleaning
Using pure water as 1% to 3%, the temperature of 60-70 ℃ of NaOH aqueous solution, cleaning about 50 minutes. Rinse with pure water to neutral.
Acid cleaning
Using pure water as 1%, citric acid aqueous solution for 30 to 40 ℃, temperature cleaning about 50 minutes. Rinse with pure water to neutral.
Note:
For the first time, the film should be recycled. The method is:
Alkaline cleaning:
With temperature is about 60-70 ℃, the concentration of 1% NaOH solution cleaning, time for about 30 minutes with deionized water rinse to neutral;
Pickling:
With temperature is about 30 to 40 ℃, the concentration of 1% lemon acid solution to clean, time for about 30 minutes with deionized water rinse to neutral.